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ARCHIVED
- Data Not Current
For Information
Purposes Only
 Glenn
Research Center
1992 Phase II
Microscopic
and Macroscopic Modeling of Layer Growth Kinetics and Morphology in
Vapor Deposition Processing
CFD
Research Corporation
Huntsville, AL
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INNOVATION
Simulation tool
(CFD-FILM) to enable development of new materials for semiconductor
and opto-electronic applications, as well as for structural and thermal
barrier coatings
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Simulation of Step Bunching in SiC
Growth (using CFD-FILM)
Optional Powerpoint
file
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ACCOMPLISHMENTS
- Developed a Monte Carlo microscopic
model to simulate specific morphological characteristics of film
growth such as step bunching, thermal roughening, polytype growth,
growth uniformity, defect formation, etc.
- Created a commercial software,
CFD-FILM, to analyze morphology of growing films
- Validated the microscopic model
against experimental data for materials such as Si, diamond and
SiC
- Coupled CFD-FILM with a general
purpose macroscopic transport/ chemistry software, CFD-ACE
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COMMERCIALIZATION
- Contributed to increased sales
of CFD-ACE to leading semi-conductor equipment vendors and process
designers (~$500K/year)
- CFD-FILM is marketable as a
stand-alone module, as well as an add-on module with CFD-ACE
- Application projects from industry
and research projects from government agencies
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GOVERNMENT/SCIENCE
APPLICATIONS
- Provides an enabling technology
for advanced materials such as GaN, GaAs, InP, and SiC
- Provides a base technology for
extension to plasma-substrate interactions in low pressure etch
processes
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| For more
information about this firm, please send e-mail to company
representative
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